Nanoscale Cleaning
A clean surface with controlled and tunable surface chemistry can be critical for improving interfacial, biological, and electronic properties of materials for optimal device and structural performance. Plasma surface treatment removes nanoscale organic contamination and alters surface chemistry without affecting the bulk material. This page provides brief summaries on the benefits and applications of plasma cleaning.
Atomic Force Microscopy (AFM)
Atomic Force Microscopy (AFM) is a versatile tool that directly measures and maps intermolecular forces with atomic resolution. AFM is used across a wide range of disciplines to characterize mechanical properties, to generate 3D surface profiles,...
Enhance Plasmonic Response in Silver Nanoparticles
Localized Surface Plasmon Resonance (LSPR) is gaining interest as a highly sensitive analytical technique to detect chemical and biological molecules in low concentrations. Plasma treatment is utilized to clean patterned substrates, specifically designed for LSPR, and...
Fluorescence Microscopy
Plasma cleaning is essential to the preparation of fluorescence microscopy samples. Plasma removes organic contamination and introduces polar groups to glass or quartz slide surfaces. As a result, plasma removes fluorescent impurities that would...
Enhancing TiO2 Photocatalytic Activity
Photocatalysts absorb light to generate electron-hole pairs and facilitate reduction-oxidation reactions, all without altering the catalyst material. In the presence of ambient water and oxygen, photocatalysts can assist with water splitting...
Photoresist: Cleaning, Spinning & Descum
To more effectively coat and pattern substrates such as silicon wafers and glass with photoresist, plasma treatment is used extensively to enhance three crucial steps: Cleaning, Spinning and Descum. An essential first task is to ensure that the...