A clean surface with controlled and tunable surface chemistry can be critical for improving interfacial, biological, and electronic properties of materials for optimal device and structural performance. Plasma surface treatment removes nanoscale organic contamination and alters surface chemistry without affecting the bulk material. This page provides brief summaries on the benefits and applications of plasma cleaning.
To more effectively coat and pattern substrates such as silicon wafers and glass with photoresist, plasma treatment is used extensively to enhance three crucial steps: Cleaning, Spinning and Descum. An essential first task is to ensure that the...read more
Due to the small size and extreme fragility of nanoelectrode surfaces, gentle plasma treatment is the optimal method for numerous electrode cleaning applications. The most popular alternative cleaning processes include mechanical polishing and...read more