Surface Patterning
Plasma can be employed in various ways to facilitate surface patterning, which is often a required processing step for the fabrication of multilayer devices, such as solar cells, sensors, and microfluidic chips. Plasma treatment can enhance surface wettability of substrates and templates to improve pattern transfer during contact printing and self-assembly. Plasma etching can selectively remove polymer thin films and 2D organic materials through a masking layer and can also be used to tune the feature size of polymer templates for fabricating patterned nanostructure arrays. This page provides brief summaries on the application of plasma treatment for surface patterning.
Porous Metal Nanoshells
Hollow porous nanoshells can be tailored to have unique physical and chemical properties for potential use in catalysis and biosensor applications. Plasma treatment can be applied to facilitate nanoshell fabrication and alter physical properties and morphology....
Nanowires
Conductive nanowires have been extensively studied recently for their potential use as transparent conducting electrodes in flexible electronics, wearable biosensors (wearable electronics), organic light emitting diodes OLEDs, and solar cells [1-3]....
Shaping Nanoparticles by Plasma Treatment
Nanoparticles (NPs), which typically range in size from a few to 100 nm diameter, are readily found in nature or can be fabricated from a broad range of materials (metallic, organic, inorganic). The combination of their material composition,...
Plasma Lithography
One common and easily employed method for surface micropatterning is plasma lithography, in which a deformable mask is placed in contact with a substrate surface before plasma treatment to create a chemical template for subsequent processing steps....