Semiconductors
In the semiconductor industry, plasma treatment plays a role in the fabrication and enhancement of microelectronic devices. This process involves using plasma to modify the surface properties of semiconductor materials, such as silicon wafers. Plasma treatment is employed to clean and etch the wafer surfaces, removing contaminants and residues that can interfere with the precision and performance of semiconductor components. It also facilitates the deposition of thin films and improves the adhesion of various layers in semiconductor devices, ensuring better electrical properties and overall device reliability.
Learn more about how plasma treatment is used for your specific application in the following application notes:
Zinc Oxide Films
Creative Commons license. Zinc oxide (ZnO) is an exciting alternative wide bandgap semiconductor that has promising use in sensors and flexible electronics. Plasma treatment can be applied to prepare surfaces for ZnO deposition, improve electrical properties through...
Photoresist: Cleaning, Spinning & Descum
To more effectively coat and pattern substrates such as silicon wafers and glass with photoresist, plasma treatment is used extensively to enhance three crucial steps: Cleaning, Spinning and Descum. An essential first task is to ensure that the...
Electrode Cleaning
Due to the small size and extreme fragility of nanoelectrode surfaces, gentle plasma treatment is the optimal method for numerous electrode cleaning applications. The most popular alternative cleaning processes include mechanical polishing and...