Surface Patterning

Harrick PlasmaApplicationsSurface Patterning

Plasma can be employed in various ways to facilitate surface patterning, which is often a required processing step for the fabrication of multilayer devices, such as solar cells, sensors, and microfluidic chips. Plasma treatment can enhance surface wettability of substrates and templates to improve pattern transfer during contact printing and self-assembly. Plasma etching can selectively remove polymer thin films and 2D organic materials through a masking layer and can also be used to tune the feature size of polymer templates for fabricating patterned nanostructure arrays. This page provides brief summaries on the application of plasma treatment for surface patterning.

Thin Film Electronics

Thin Film Electronics

Thin film electronic devices made using flexible materials, such as plastics, metals, or polymers, are growing in popularity. Their ability to be bent, folded, and rolled as well as being lightweight and durable makes them ideal for a variety of...

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Alveole Primo

Alveole Primo

Harrick Plasma is thrilled to announce a new collaboration effort with Alvéole, makers of PRIMO: Bioengineering Technology. PRIMO is a maskless photopatterning platform that offers precise control over the cellular microenvironment. Applications of...

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Graphene Transfer

Graphene Transfer

Graphene is commonly deposited by chemical vapor deposition (CVD) on a growth substrate followed by transfer onto a target substrate appropriate for its specific application. Plasma treatment can be applied to support and facilitate various graphene...

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