Note: A detailed User's Manual is provided with all Harrick Plasma Cleaner models.

Principles of Operation

  • The sample is placed in the plasma vacuum chamber
  • The chamber is evacuated by a vacuum pump and process gas(es) are admitted into the chamber using either the needle valve or PlasmaFlo accessory.
  • The gases are subject to induced RF magnetic and electric fields generated by a solenoidal coil current
  • Plasma is generated through the subsequent RF/collisional heating of the electrons in the gas

Details of Operation

  • The plasma vacuum chamber door has an o-ring quick disconnect seal for easy access to the chamber
  • The vacuum pump is connected to an outlet at the back of the reaction chamber
  • The needle valve is used to bleed in process gas and control the pressure during plasma processing
  • The RF power level can be adjusted by means of a three-way selector switch
  • The plasma will emit a characteristic glow, which visibly indicates the successful generation of the plasma state
  • The temperature change of a substrate during plasma treatment is minimal
  • The 3-way valve is used to quickly switch from bleeding in gas, isolating the chamber, and venting

Surface Cleaning / Modification

  • The interaction between the plasma and the surface is determined by:
    • The nature of the substrate and surface contaminant layers
    • The process gases used
    • The pressure and flow rate of the gases
    • The RF power level & length of sample exposure
  • For surface cleaning, a few seconds exposure, following pump down of the chamber and formation of plasma, is often adequate
  • Surface cleanliness can be tested most easily by observing the wettability of the sample: on a clean surface, water drops will not bead, but will spread out in a uniform film


(USA): 800-640-6380
(Intl): +001-607-272-5070