HARRICK PLASMA

Tailor-Made Functionalized Silicon And/Or Germanium Surfaces

The present invention relates to functionalized silicon and/or germanium surfaces, methods for the preparation of such tailor-made functionalized silicon and/or germanium surfaces, the use of such tailor-made functionalized silicon and/or germanium surfaces for the preparation of surface-bonded organic materials and the use in industrial devices. The silicon and/or germanium surfaces comprise silicon nitride, silicon carbide, germanium nitride, germanium carbide and silicon germanium surfaces.

Zuilhof, Johannes Teunis, Catharina Gerarda Petronella Henrica Schröen, Ahmed Arafat Mohamed Khamis

Wageningen University

WO2005123273 A1

0000-00-00

2005-12-29

2007-08-01

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