Soft lithography of functional oxide materials

Soft lithographic techniques were applied to pattern two sol-gel model systems PZT and TiO2. These materials were patterned in various lengths scales by micromolding in capillaries and microtransfer molding techniques. The shape formation from these two techniques and materials systems were compared to each other. The phase analysis of the patterns was performed with XRD. The surface and topographic analysis were performed by secondary electron microscopy (SEM) and atomic force microscopy (AFM). The various factors during and after patterning such as drying, annealing procedures and their affects on the shape formation, volumetric shrinkage and densification were investigated.
Their influences were small only 5 % for the volume shrinkage and 0.2 µm in center
height for the PZT double peak line patterns.

Stadman, S., S. Khan

University of Twente




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