A new patterning technique for the extracellular matrix (ECM) deposited on a Si substrate was developed with the use of a low-frequency atmospheric-pressure plasma and a metal stencil mask. The development of such a patterning technique for cell arrangement is a crucial step for the development of future cell chips. In this study, optimal process conditions for ECM patterning over the size of a typical single chip (about 1 cm2 ) were achieved and the obtained ECM patterns were directly observed by fluorescence labelling. It was also demonstrated that HEK293 cells (human embryo kidney cells) attach to and proliferate on the ECM layer patterned by this technique, arranging themselves on the Si substrate in the mask pattern.
Ando, A., T. Asano, T. Urisu, S. Hamaguchi
Journal of Physics D: Applied Physics