HARRICK PLASMA

Large Area Resist-Free Soft Lithographic Patterning of Graphene

Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications.

George, Antony, S. Mathew, Raoul van Gastel, Maarten Nijland, K. Gopinadhan, Peter Brinks, T. Venkatesan, Johan E. ten Elshof

Small

9

711-715

2012

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